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1 The study of influence of the gas flow rate to etched layer thickness, and roughness of the anisotropy field of gallium arsenide is etched in the plasma chemical etching process [会议论文]

作者:Ageev, O.A.^1;Klimin, V.S.^1;Solodovnik, M.S.^1;等

关键词:Anisotropy field;Chemical-etching process;...

会议举办机构:Department of Nanotechnologies and Microsystems, Institute of Nanotechnologies, Electronics and Electronic Equipment Engineering, Southern Federal University, 2 Shevchenko Street, Taganrog

会议时间:2016

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2 A micro heat exchanger microfabricated from bulk aluminium [会议论文]

作者:Scotti, G.^1, Franssila, S.^1

关键词:Area density;Etched surface;...

会议举办机构:Aalto University, Department of Materials Science and Technology, Espoo, Finland^1

会议时间:

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3 Automated unit of the chemical wet etching [会议论文]

作者:Sukhoroslova, Yu V.^1, Veselov, D.S.^1, Voronov, Yu A.^1

关键词:Alkaline etchants;Automated units;...

会议举办机构:National Research Nuclear University MEPhI, Moscow Engineering Physics Institute, Kashirskoe shosse 31, Moscow

会议时间:2019

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